Background
Langford, Alison A. was born on June 13, 1956 in Passaic, New Jersey, United States.
Langford, Alison A. was born on June 13, 1956 in Passaic, New Jersey, United States.
Harvard University (Bachelor of Arts, magna cum laude, 1978). University of California at Berkeley (Doctor of Philosophy, 1983).
Worked at Greenlee, Winner and Sullivan, Professional Corporation (Boulder, Colorado) specializing in Patent, Trademark and Copyright, Biotechnological, Chemical, Pharmaceutical and High Technology Instrumentation Patent Law. Registered to practice before United States. Patent and Trademark Office, 1993.
Company-Author: "Effect of Fluorine on the structural and electronic properties of a-Si:H:F," Physical Review 41:8359, 1990.
"Correction for Multiple Reflections in Infrared Spectra of Amorphous Silicon, " Solar Cells 27:373, 1989. "Window Cleaning and fluorine incorporation by XeF2 in photochemical vapor deposition," J. Vac.
Science Technological B7 (3):437, 1989. "Determination of the fluorine content in a-Si:H:F by infrared spectroscopy, electron probe microanalysis, x-ray photoelectron spectroscopy and secondary ion mass spectrometry," J. Applied
Physical 65:5154, 1989; "Intramolecular vibrational relaxation of a polyatomic in the solid state.
I. DCN in Xe," J. Chemistry Physical 82:1263, 1985; "Intramolecular vibrational relaxation of a polyatomic in the solid state. World War II HC14 North and HC15 North in Ar, Kr and Xe," J. Chemistry Physics.
83:975, 1985.
"Multiple trapping sites and symmetry splitting in cryogenic matrices: Infrared spectroscopy of HCN in Ar, Kr and Xe," J. Chemistry Physical 82:1255, 1985; "Activation and cleaning of oxide surfaces by a cw Carbon dioxide laser," Surface Science 136:L19, 1984. Universities, research institutions and corporations at the leading edge of research and innovation often have unique problems which require individual, sometimes creative solutions.
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