Elijah Vladimirovich Karpov, Russian, American process engineer. Achievements include patents in field; areas of expertise include Chemical Vapor Deposition, Si, Gallium Arsenide semiconductor devices/physics, semiconductor technology. Member Materials Research Society, Microscopy Society of America, Vacuum Society of America.
Karpov, Elijah Vladimirovich was born on March 30, 1964 in Moscow. Came to the United States, 1991. Son of Vladimir and Ludmila (Babchinitser) Karpov.
Master of Science in Electrical Engineering, Moscow Institute Steel & Alloys, 1986. Doctor of Philosophy in Engineering, University Minnesota, 1996.
Research engineer P.N. Lebedev Institute Physics, Moscow, 1986-1991. Research assistant chemical engineering department University Minnesota, Minneapolis, 1991-1996. Process development engineer Mitsubishi Silicon American, Salem, Oregon, 1996-1999.
Senior process engineer Intel Corporation, Santa Clara, California, since 1999.
Member Materials Research Society, Microscopy Society of America, Vacuum Society of America.