Background
Reimer, Klaus was born on June 12, 1956 in Hamburg, Germany.
Reimer, Klaus was born on June 12, 1956 in Hamburg, Germany.
Diploma in Physics, University Hamburg, 1983. Doctor Ing. in Electrical Engineering, Technology University Berlin, 1991.
Research associate, e-beam lithography for x-ray maskmaking Fraunhofer Institute für Siliziumtechnologie, Berlin, 1984—1988, leader, e-Beam lithography groupe, 1989—1994, senior research associate, Microelectromechanical Systems technical Itzehoe, Germany, 1995—2004, head, Microelectromechanical Systems department, since 2005.