Li-Chung Daniel Ho

Background

Daniel Ho, Li-Chung was born on August 17, 1965 in Chilung, Taiwan.

Education

University of Michigan, Dearborn (Bachelor of Science in Mechanical Engineering, 1983). Case Western Reserve University (Juris Doctor, 1997).

Career

Worked at Dorn, McEachran, Jambor & Keating (Chicago, Illinois) specializing in Patent Law, Trademark Law, Copyright Law, Unfair Competition Causes. Admitted to the bar, 1997, Illinois and United States. District Court, Northern District of Illinois.

Professional Engineer, Michigan, 1994.

Achievements

• Li-Chung Daniel Ho has been listed as a reputable lawyer by Martindale-Hubbell.