Background
Adams, Lindsay S. was born on June 2, 1968 in Wandsworth, England.
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Lindsay S. Adams
Edit ProfileEducation
Hofstra University (Bachelor of Science, 1990). Franklin Pierce Law Center (Juris Doctor, 1993).
Career
Worked at Hoffmann & Baron (Jericho, New York) specializing in Patent, Trademark, Copyright, International Trade Law and Related Litigation. Admitted to the bar, 1994, New New York Registered to practice before United States.
Patent and Trademark Office.
Student Editor-in-Chief, the International Development & Education Award-The Journal of Law & Technology, 1992-1993. Member: American Bar Association.
American Chemical Society. American Intellectual Property Law Association.
New
Hoffmann & Baron specializes in the practice of intellectual property law.
We are experienced in the procurement and enforcement of intellectual property rights relating to patents and copyrights, as well as unfair competition matters such as enforcement of trademarks. Our firm is heavily involved in counseling corporate clients as well as sole inventors regarding their intellectual property matters. Hoffmann & Baron has been actively engaged in trial and appellate litigation in the State and Federal Courts in all areas of the country and before the International Trade Commission.
The firm is also engaged in antitrust matters both on a domestic and international scale and has made presentations before the Trade Commission regarding invocation of anti-dumping and other protective domestic business practices.
Hoffmann & Baron has also represented several clients in complex copyright and computer law cases both before the Patent and Copyright Offices as well as in the Federal Courts.
Achievements
Membership
Member: American Bar Association. American Chemical Society. American Intellectual Property Law Association.
