Richard A. Gottscho

Background

Gottscho, Richard A. was born on May 19, 1952 in Lancaster, Pennsylvania, United States.

Education

Bachelor of Science in Chemistry, Pennsylvania State University, 1974; Doctor of Philosophy in Physical Chemistry, Massachusetts Institute of Technology, 1979.

Career

Post-doctoral fellow, Massachusetts Institute of Technology, Cambridge, Massachusetts, 1979-1980; member technical staff, American Telephone & Telegraph Company Bell laboratories, Murray Hill, New Jersey, 1980-1986; head electronic materials department, American Telephone & Telegraph Company Bell laboratories, Murray Hill, New Jersey, 1986-1987; head electronics packaging department, American Telephone & Telegraph Company Bell laboratories, Murray Hill, New Jersey, 1987-1993; head display research department, American Telephone & Telegraph Company Bell laboratories, Murray Hill, New Jersey, 1993-1996; director research, Lam Research, Fremont, California, 1996; director plasma Chemical Vapor Deposition, Lam Research, Fremont, California, since 1996. Vice-chair panel on plasma process National Research Council, Washington, 1991-1992, vice-chair plasma science committee, 1993-1995.

Achievements

• Richard A. Gottscho has been listed as a noteworthy Physical chemist by Marquis Who's Who.

Membership

Fellow American Vacuum Society (chair plasma science technical 1993, Peter Mark award 1986), American Physical Society.