Background
Kern, Werner was born on March 18, 1925 in Basel, Switzerland. Son of Karl and Josephine (Voelker) Kern. came to the United States 1948.
(Remarkable advances have been made in recent years in the...)
Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.
http://www.amazon.com/gp/product/0127282505/?tag=2022091-20
(This sequel to the 1978 classic, Thin Film Processes, giv...)
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application
http://www.amazon.com/gp/product/0127282513/?tag=2022091-20
(This sequel to the 1978 classic, Thin Film Processes, giv...)
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. • Provides an all-new sequel to the 1978 classic, Thin Film Processes • Introduces new topics, and several key topics presented in the original volume are updated • Emphasizes practical applications of major thin film deposition and etching processes • Helps readers find the appropriate technology for a particular application
http://www.amazon.com/gp/product/B01H5GQHK8/?tag=2022091-20
Kern, Werner was born on March 18, 1925 in Basel, Switzerland. Son of Karl and Josephine (Voelker) Kern. came to the United States 1948.
Certified Chemistry, U. Basel, 1944; Diploma Langs., Polyglot School of Langs., Montreux, Switzerland, 1947; Bachelor in Chemistry, Rutgers University, 1955.
Chemist, Hoffman-LaRoche, Basel, 1942-1948; research chemist, Hoffman-LaRoche, Nutley, New Jersey, 1948-1955; chief chemist, Nuclear Corporation of America, Denville, New Jersey, 1958-1959; scientist, Solid State division Radio Corporation of America, Somerville, New Jersey, 1959-1964; fellow technical staff, Radio Corporation of America laboratories, Princeton, New Jersey, 1964-1987; president, Werner Kern Associations, E. Windsor, New Jersey, since 1987; senior scientist, Lam Research Corporation, San Diego and Fremont, California, 1988-1992. Technical consultant Teltech, Inc., Minneapolis, since 1988. Lecturer American Vacuum Society, since 1981.
(This sequel to the 1978 classic, Thin Film Processes, giv...)
(This sequel to the 1978 classic, Thin Film Processes, giv...)
(Remarkable advances have been made in recent years in the...)
Fellow Electrochemical Society (chairman Dielectrocs division 1982-1984, advisor solid state division 1985-1987, Callinan award 1971). Member American Vacuum Society, Material Research Society, Sigma Xi.
Married Mildred C. Patti, November 20, 1955. Children: Jeffrey K., Vanessa A., Peter R.