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Hiroshi Ishiwara

electronics engineer

Hiroshi Ishiwara, Japanese electronics engineer. Achievements include research of heteroepitaxy of conductive and insulating thin films on semiconductor substrates and research on ferroelectric memory. Recipient prize Japan International Business Machines Corporation Science Prize Committee, 1990, Inoue Science prize, 1994, Ichimura Technology prize, 1994, ISIF Honors, 2000.

Background

Ishiwara, Hiroshi was born on November 6, 1945 in Yamaguchi, Japan. Son of Sei-icihiro and Nobuko Ishiwara.

Education

Bachelor of Engineering, Tokyo Institute of Technology, 1968. MEng, Tokyo Institute of Technology, 1970. Doctor of Engineering, Tokyo Institute of Technology, 1973.

Career

Research associate Tokyo Institute of Technology, 1973-1976, associate professor, 1976-1989, professor, since 1989.

Achievements

  • Achievements include research of heteroepitaxy of conductive and insulating thin films on semiconductor substrates and research on ferroelectric memory.

Works

  • Author: Semiconductor Devices, 1990, Semiconductor Electronics, 2002. Editor: Heteroepitaxy on Silicon: Fundamentals, Structure, Devices.

Membership

Fellow Institute of Electrical and Electronics Engineers. Member Material Research Society, Japanese Society Applied Physics.

Connections

Married Kayoko Hoshi, April 7, 1974. 2 children.

father:
Sei-icihiro Ishiwara

mother:
Nobuko Ishiwara

spouse:
Kayoko Hoshi