Background
Thallemer, John D. was born on December 18, 1958 in Chicago, Illinois, United States.
Thallemer, John D. was born on December 18, 1958 in Chicago, Illinois, United States.
Saint Mary"s College (Bachelor of Arts, cum laude, 1981). Elmhurst College (Bachelor of Science, 1987). John Marshall Law School (Juris Doctor, 1988).
Worked at Luedeka, Neely & Graham, Professional Corporation (Knoxville, Tennessee) specializing in Patent, Trademark, Copyright and Unfair Competition Law. Computer Law. Trial Practice in all Courts and before the United States. Patent and Trademark Office.
Admitted to the bar, 1988, Illinois.
1989, Michigan; 1994, Tennessee. Registered to practice before United States.
Patent and Trademark Office. Chemist for Nalco Chemical Company, 1982-1989.
Patent Attorney, Dow Corning Corporation, 1989-1992, Eastman Chemical Company, 1992-1996.
Member: Illinois State and Tennessee Bar Associations. State Bar of Michigan. Luedeka, Neely & Graham traces its roots to the oldest existing law firm in Chicago, which was founded in 1859, predating the Great Chicago Fire.
Edwin M. Luedeka moved to Tennessee from Chicago in 1968 and opened a Knoxville office of the Chicago firm then known as Anderson, Luedeka, Fitch, Even & Tabin.
In 1979, the Knoxville office became an independent firm which is now known as Luedeka, Neely & Graham, Professional Corporation
Illinois State Bar Association. State Bar of Michigan. Saginaw Valley Patent Law Association.
(Patent Attorney).