Jonathan P. Soifer

Background

Soifer, Jonathan P. was born on May 28, 1963 in Albany, New York, United States.

Education

Washington University (Bachelor of Science in Chemical Engineering, 1985. Juris Doctor, 1989).

Career

Worked at Polster, Lieder, Woodruff & Lucchesi, L.C. (Saint Louis, Missouri) specializing in Patent, Trademark, Intellectual Property. Admitted to the bar, 1989, Missouri, United States. District Court, Eastern District of Missouri, United States.

District Court, Central District of Illinois, United States.

Court of Appeals for the Federal Circuit and United States. Court of Appeals, Eighth Circuit.

Registered to practice before United States. Patent and Trademark Office.

Phi Alpha Delta. Member: The Bar Association of Metropolitan Saint Louis (Member, Patent, Trademark and Copyright Section).

The Missouri Bar. American Bar Association (Member, Sections on: Patent, Trademark and Copyright. Science and Technology).

Achievements

• Jonathan P. Soifer has been listed as a reputable lawyer by Martindale-Hubbell.

Membership

Member: The Bar Association of Metropolitan Saint Louis (Member, Patent, Trademark and Copyright Section). The Missouri Bar; American Bar Association (Member, Sections on: Patent, Trademark and Copyright. Science and Technology).