Klaus Bergmann, research scientist. Achievements include development of light source for EUV lithography, x-ray microscopy and metrololgy for extreme ultraviolet radiation; research in generation of XUV light from pulsed plasmas.
Career
Scientist plasma physics Rheinisch-Westfälische Technische Hochschule Aachen University, Germany, 1992—1999. Group leader plasma technical Fraunhofer Institute Laser Technology, since 1999.
