Background
Glassman, Timothy Edward was born on January 28, 1964 in Buffalo, New York, United States. Son of Edward L. and Ann R. (Harnish) Glassman.
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Timothy Edward Glassman
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Timothy Edward Glassman, American Research chemist, engineer. Achievements include patentee applications in field; investigation ofthe reduction of nitrogen to ammonia with model catalytic systems; prepared radiopharmaceutical precursors; metal organic chemical vapor deposition of complex metal oxides and prepared precursors for blue phosphors, fiber coatings, dielectric and ferroelectric thin films.
Education
Bachelor of Science in Chemistry, State University of New York, 1986; Bachelor in Computer Science, State University of New York, 1987; Doctor of Philosophy in Inorganic Chemistry, Massachusetts Institute of Technology, 1991.
Career
Intern, Electrosynthesis Company, Cheektowaga, New York, 1985-1986; intern, E.I. Dupont deNemours, Wilmington, Delaware, 1986-1987; postdoctoral, Los Alamos National Laboratory, 1991-1994; research chemist, Advanced Technology Materials, Danbury, Connecticut, 1994-1996; senior process engineer, Intel Corporation, Hillsboro, Oregon, since 1997.
Achievements
Membership
Member National Ski Patrol, Los Alamos, 1994. Member American Chemical Society, Materials Research Society, Phi Beta Kappa, Sigma Xi.
