Background
Makabe, Toshiaki was born on May 8, 1947 in Yamato, Kanagawa, Japan.
(Low temperature plasmas have had a very broad range of ap...)
Low temperature plasmas have had a very broad range of applications ever since their discovery. However, recent developments in the dextrous handling of dry etching non-equilibrium plasma has attracted a great common interest that has driving force behind the major developments in diagnostic, theoretical, and numerical techniques during the past two decades. A greater fundamental understanding of the kinetics of radio-frequency (rf) plasmas and their interaction with surfaces in regard to the process of large scale integrated circuits has been achieved through the cooperation between academia and industry. At the same time, new applications have become possible, and our recently revealed basic understanding of low temperature rf plasmas has diffused to other areas of plasma physics. Each chapter of this book is edited in the same form as the article collected in the special issue of Applied Surface Science, which is published in memory of the International Workshop on Basis for Low Temperature Plasma Applications at Hakone in Japan on July 24 - 25 of 2001. The basic goal in the selection of topics was to cover the range of issues that represent the building blocks of the complex, "vertically integrated" plasma simulation schemes including surface processes. We also showed examples of integrated codes and how they are implemented in the development of new strategies of plasma processing. Such codes may be used both in modern experiments and in the computer aided design and control of the plasma devices of the next generation. These are based on the transport theory of electrons, ions, and neutrals, as well as on numerical modellings and on the available collision and transport data describing gas and surface phases. We also cover some aspects of simulation and modeling aimed at higher density plasmas. All the chapters present a relatively complete review of the developments in these fields in the past two decades as well as a review of their current status of development. We achieved an excellent blend of research reviews from both academia and industry. We hope that this volume may be used as a guide for future developments in both the science and in the application of low temperature rf plasmas.
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( Beyond enabling new capabilities, plasma-based techniqu...)
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
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(Without plasma processing techniques, recent advances in ...)
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, etching, and even process monitoring and diagnosis. Plasma Electronics: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods necessary to bring these technologies from the laboratory to the factory. Beginning with an overview of the basic characteristics and applications of low-temperature plasma, preeminent experts Makabe and Petrovic explore the physics underlying the complex behavior of non-equilibrium (or low temperature) plasma. They discuss charged particle transport in general and in detail as well as macroscopic plasma characteristics and elementary processes in gas phase and on surfaces. After laying this groundwork, the book examines state-of-the-art computational methods for modeling plasma and reviews various important applications including inductively and capacitively coupled plasma, magnetically enhanced plasma, and various processing techniques, while numerous problems and worked examples reinforce the concepts. Uniquely combining physics, numerical methods, and practical applications, Plasma Electronics: Applications in Microelectronic Device Fabrication equips you with the knowledge necessary to scale up lab bench breakthroughs into industrial innovations.
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Makabe, Toshiaki was born on May 8, 1947 in Yamato, Kanagawa, Japan.
Bachelor in Plasma Physics, Keio University, Yokohama, Japan, 1970. Doctor of Philosophy, Keio University, Yokohama, Japan, 1975.
Instructor Keio University, Yokohama, 1975-1980, lecturer, 1980-1984, associate professor, 1984-1991, professor, since 1991, head department, 1996—2000, director School International Design Engineer, 2001—2003, dean faculty of science and technical, since 2007. Executive committee Gaseous Electronics Conference, American Physical Society, New York, 1993-1995. Leader 21st Center of Excellence for optical and electronic device technical for access network, sponsored Ministry of Education, Culture, Sports, Science and Technology, Japan, since 2002.
Science council Japan.
( Beyond enabling new capabilities, plasma-based techniqu...)
(Without plasma processing techniques, recent advances in ...)
(Low temperature plasmas have had a very broad range of ap...)
Fellow: Institute of Physics. Member: Yugoslav Academy Engineering (foreign), American Vacuum Society, Electrochemical Society, Physical Society Japan, Japan Society Applied Physics (secretary general plasma electronics 1993-1995, division representative 1998—2000, board directors 2004-2005, editor-in-chief 2005, trustee 2006).
Married Shigeko Nakazato, January 1977. Children: Hideaki, Akira.