Background
Reinke, Wayne F. was born on June 26, 1966 in Waukegan, Illinois, United States.
Reinke, Wayne F. was born on June 26, 1966 in Waukegan, Illinois, United States.
Rochester Institute of Technology (Bachelor of Science in Electrical Engineering, 1989). Albany Law School (Juris Doctor, 1992).
Worked at Heslin & Rothenberg, Professional Corporation (Albany, New York) specializing in Patents, Trademark, Copyright and Unfair Competition Law. Litigation.
Admitted to the bar, 1993, New New York Registered to practice before United States.
Patent and Trademark Office.
Lead Article Editor, Albany Law Journal of Science and Technology. Author: "Limiting the Scope of Discovery: The Use of Protective Orders and Document Retention Programs in Patent Litigation," 2 Alberta.
Lord Justice Service Civil International. & TECH. 175 (1992). Member: Eastern New York Intellectual Property Law Association (Secretary/Treasurer, 1993-1994, Vice-President, 1994-1995, President, 1995-1996).
American Intellectual Property Law Association.
Heslin & Rothenberg, Professional Corporation is devoted exclusively to helping clients protect and capitalize on their intellectual property. The Firm handles all aspects of acquiring and enforcing intellectual property rights, both domestic and foreign, including licensing and litigation. Advice and assistance are provided in patent, trademark, trade secret, trade dress, copyright and unfair competition matters, as well as computer and technology law.
Member: Eastern New York Intellectual Property Law Association (Secretary/Treasurer, 1993-1994, Vice-President, 1994-1995, President, 1995-1996). American Intellectual Property Law Association.