Education
Bachelor of Science, University of Science and Technology of China, 1982. Doctor of Philosophy, Beijing Normal University, 1988.
Bachelor of Science, University of Science and Technology of China, 1982. Doctor of Philosophy, Beijing Normal University, 1988.
Visiting assistant professor University Illinois, Urbana-Champaign, 1992—1996. Principal engineer Digital Equipment Corporation, 1996—1998. Senior engineer Intel Corporation, Santa Clara, 1998—2000.
Advisory engineer International Business Machines Corporation Corporation, Hopewell Junction, New York, 2000—2009. Professor Institute Microelectronics Chinese Academy of Sciences, since 2009.
Achievements include first to study of nano-particle sintering using molecular dynamics. First to accurately modeling of impurity Ge and Sb diffusion with vacancy-mechanism in SiGe. 148 patents including high performance Metal–oxide–semiconductor field-effect transistor with dual stress liner technique, stress proximate technique and recessed gate.
Symposium co-chair China Semiconductor Technology International Conference.