Background
Dessauer, John Hans was born on May 13, 1905 in Aschaffenburg, Germany. Son of Hans and Bertha (Thywissen) Dessauer. came to the United States, 1929, naturalized, 1936.
Dessauer, John Hans was born on May 13, 1905 in Aschaffenburg, Germany. Son of Hans and Bertha (Thywissen) Dessauer. came to the United States, 1929, naturalized, 1936.
Bachelor of Science, Institute of Technology, Munich, Germany, 1926. Master of Science, Doctor of Engineering, Institute of Technology, Aachen, Germany, 1929. Doctor of Humane Letters, Le Moyne College, 1963.
Doctor of Science (honorary), Clarkson College, 1975. Doctor of Laws (honorary), Fordham University, 1979.
Chemist Ansco, Binghamton, New York, 1929-1935. Chemist Haloid Company, Rochester, 1935-1938, research director, 1938-1946, vice president charge research and product development, director, 1946-1959. (name changed to Haloid Xerox, Inc., 1958).
Executive vice president research and engineering division Xerox Corporation, 1959-1968, vice chairman board, until 1970, director, until 1973.
Trustee emeritus Fordham University. Fellow Photographic Society American, American Institute Chemists. Member American Chemical Society, National Academy Engineering.
Married Margaret B. Lee, June 29, 1935. Children: John Philip, Margot, Thomas David.